The center concentrates on the plasma treatment and optical measurement technology, as well as the development of the advanced equipments. By integrating the processing with the equipment design, the sophisticated research and development system is built. The department aims to build up the leading-edge R&D platforms via establishing the university-industry cooperation, which not only has important influence to academic community and industry domestically, but also becomes competitive in the semiconductor industry internationally.
♦ Leading-edge IC fabrication and testing equipments;
♦ Solar cell manufacturing technology and equipments;
♦ High efficient LED manufacturing technology and equipments;
♦ Optical measurement instruments;
♦ MEMS processing technique;
♦ Key technology of RF power source.
RIE-100 Reactive Ion Etching System
ICP-100 High Density Plasma Etching System
PECVD-200 Plasma Enhanced Chemical Vapour Deposition System
RFG Systems of Solid State RF Power