The 11th International Plasma-Based Ion Implantation & Deposition (11th PBII&D) was held in Harbin, China, from Sept.8-12, 2011. Mr. LIU Jie, a postgraduate in the Microelectronic Equipment Technology Department (Department No.8) at the Institute of Microelectronics of Chinese Academy of Sciences （IMECAS）, made a report entitled A Novel Method to Texture Silicon for Solar Cells at the conference. LIU’s paper, High efficiency black silicon solar cell with self-cleaning dual-scale textured surface had won the Excellent Student Paper Award (award ratio: 2%) in 11th PBII&D.
LIU initiated research on black silicon and solar battery in 2009 with the support of his supervisor Prof. XIA Yang. He prepared multiple black silicons so far with the plasma immersion ion implantation equipment developed by XIA’s group. The black silicons prepared in this way have lower cost and higher production efficiency than those prepared by femtosecond laser, thus promising large-scale manufacture for solar cells, which receives favorable comments and attention from Industry experts.
The Excellent Student Paper Certificate of the 11th PBII&D (Image by IMECAS)
The first Plasma-based Ion Implantation and Deposition(PBII&D) workshop started in 1993 in USA. Since then the workshop has brought together PBII&D-related scientists from all over the world. Now the PBII&D Workshop is the longest standing and most respected international meeting devoted to plasma-based processing technologies.
The PBII&D 2011 has provided an opportunity to exchange the latest scientific results in plasma based ion implantation technology comprising plasma based ion implantation and deposition, high power pulsed magnetron sputtering, systems and industrial application, plasma diagnostics, modeling and fundamentals, nanostructures, materials surface processing and analysis, semiconductor, DLC (diamond-like carbon) and diamond technologies, biomaterials, polymers, surface physics, plasma source, IBAD (ion beam assisted deposition), IB (ion beam) implantation and plasma nitriding, etc.
Institute of Microelectronics of Chinese Academy of Sciences
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